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Titlebook: Semiconductor Interfaces at the Sub-Nanometer Scale; H. W. M. Salemink,M. D. Pashley Book 1993 Kluwer Academic Publishers 1993 Helium-Atom

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發(fā)表于 2025-3-21 19:10:28 | 只看該作者 |倒序瀏覽 |閱讀模式
書目名稱Semiconductor Interfaces at the Sub-Nanometer Scale
編輯H. W. M. Salemink,M. D. Pashley
視頻videohttp://file.papertrans.cn/865/864848/864848.mp4
叢書名稱NATO Science Series E:
圖書封面Titlebook: Semiconductor Interfaces at the Sub-Nanometer Scale;  H. W. M. Salemink,M. D. Pashley Book 1993 Kluwer Academic Publishers 1993 Helium-Atom
描述The Advanced Research Workshop on the Physical Properties of Semiconductor Interfaces at the Sub-Nanometer Scale was held from 31 August to 2 September, 1992, in Riva del Garda. Italy. The aim of the workshop was to bring together experts in different aspects of the study of semiconductor interfaces and in small-scale devices where the interface properties can be very significant It was our aim that this would help focus research of the growth and characterization of semiconductor interfaces at the atomic scale on the issues that will have the greatest impact on devices of the future. Some 30 participants from industrial and academic research institutes and from 11 countries contributed to the workshop with papers on their recent wode. . ‘There was ample time for discussion after each talk. as well as a summary discussion at the end of the meeting. The major themes of the meeting are described below. The meeting included several talks relating to the different growth techniques used in heteroepitaxial growth of semiconductors. Horikoshi discussed the atomistic processes involved in MBE, MEE and MOCVD, presenting results of experimental RHEED and photoluminescence measurements; Foxo
出版日期Book 1993
關鍵詞Helium-Atom-Streuung; STM; Semiconductor; semiconductors; spectroscopy
版次1
doihttps://doi.org/10.1007/978-94-011-2034-0
isbn_softcover978-94-010-4900-9
isbn_ebook978-94-011-2034-0Series ISSN 0168-132X
issn_series 0168-132X
copyrightKluwer Academic Publishers 1993
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Dipole Layers at GaAs Heterojunctions and their Investigationinterface. We describe the control of the band discontinuities at InAs-GaAs junctions by δ-d oping in the GaAs, close to the interface, and by submonolayer quantities of Be grown right at the interface. The investigation of the barriers by ballistic electron emission microscopy is also described
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Semiconductor Interfaces at the Sub-Nanometer Scale978-94-011-2034-0Series ISSN 0168-132X
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A Comparison of Growth by Molecular Beam Epitaxy, Metalorganic Chemical Vapour Deposition and Chemiccerning the preferred growth directions as a function of growth conditions. Finally I will discuss the question of selected area growth.In making the above comparisons I hope to highlight the key factors needed to assess the relative quality of the interfaces prepared by each technique
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