Titlebook: Polishing of Diamond Materials; Mechanisms, Modeling Yiqing Chen,Liangchi Zhang Book 2013 Springer-Verlag London 2013 CP4604.Diamond Compos

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調(diào)情

Chemo-Mechanical Polishing, and temperature applied. Using an appropriate polishing condition, a chemo-mechanical polishing process can produce quality surfaces with an average surface roughness (Ra) of 29?nm at a material removal rateMaterial removal rate of 1.39?μm per hour.

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暗諷

Dynamic Friction Polishing: Characterization and Material Removal Mechanisms,ectroscopy, electron diffraction, x-ray photoelectron spectroscopy, energy dispersive x-ray analysis, and electron energy loss spectroscopy. The analysis provides an overall picture of the surface quality attainable by the DFP.

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978-1-4471-5906-3Springer-Verlag London 2013

AGONY

Polishing of Diamond Materials978-1-84996-408-1Series ISSN 1619-0181 Series E-ISSN 2365-0761

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