Titlebook: Oxide and Nitride Semiconductors; Processing, Properti Takafumi Yao,Soon-Ku Hong Book 2009 Springer-Verlag Berlin Heidelberg 2009 Epitaxy.L

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https://doi.org/10.1007/978-3-540-88847-5Epitaxy; Light emitting diode; Nanostructure; Nitride semiconductors; Oxide semiconductors; optical prope

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Control of Polarity and Application to Devices,ity of grown films is very important in exploring and investigating materials properties of polar wurtzite nitride and oxide films as the properties of films and devices have been strongly affected by the polarity of films. After describing various determination techniques of polarity of wurtzite Ga

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Growth of Nonpolar GaN and ZnO Films,wing pure m-plane films is not easy and other planes coexist parallel to the interface. In this chapter, growth of nonpolar GaN and ZnO films is described. Growth characteristics and properties of nonpolar (a-plane and m-plane) and semipolar GaN films, and nonpolar ZnO films are discussed. The empha

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Structural Defects in GaN and ZnO,ed. Heteroepitaxial GaN and ZnO films have various kinds of structural defects including misfit dislocations, threading dislocations, stacking faults, nanopipes, and inversion domain boundary, which inevitably affect the properties of the films and devices. Transmission electron microscopy of these

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Electrical Properties of GaN and ZnO,tivity are easily formed in the materials during growth. These defects are generated as a result of crystal imperfections, which have an influence on the material properties and device performance by introducing shallow or deep levels into the bandgap. In this chapter, first, ohmic contacts to GaN a