Titlebook: Laser-Assisted Microtechnology; Simeon M. Metev,Vadim P. Veiko Book 1998Latest edition Springer-Verlag Berlin Heidelberg 1998 Laser Meltin

AMPLE

er band pass of energy, and various recording units to detect the x-rays. In this chapter we deal with the experimental arrangement as a whole. There are general aspects to consider in setting-up an x-ray experiment: The sample is illuminated by an incident beam striking the sample surface under a d

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Simeon M. Metev,Vadim P. Veikoer band pass of energy, and various recording units to detect the x-rays. In this chapter we deal with the experimental arrangement as a whole. There are general aspects to consider in setting-up an x-ray experiment: The sample is illuminated by an incident beam striking the sample surface under a d

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Simeon M. Metev,Vadim P. Veikoesult of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer

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Laser Micromachining of Thin Films,y the radiation-flux density. At the same time it is possible to change the dimensions, shape, and electrical and optical parameters of the thin-film elements not only by direct removal of film material, but also by thermal and thermo-chemical treatment (Chap.7). An important requirement in film tre

BIAS

Local Laser- Induced Heat Treatment,allowing local heating of very tiny parts. Secondly, heating rates of up to 10. K/s can be achieved for periods from a few nanoseconds to hundreds of milliseconds. This allows the precise control of thermally-induced structural modifications of material only in the zone under treatment, without affe

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