Titlebook: Ion Tracks and Microtechnology; Principles and Appli Reimar Spohr,Klaus Bethge Book 1990 Friedr. Vieweg & Sohn Verlagsgesellschaft mbH, Bra

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Concluding remarksThe sweeping progress of ion source and accelerator technology is a challenge for engineers and scientists to promote as well their practical uses.

machination

AGGER

青少年

Fibrinogen

Lice692

Resulting structuresectively in the form of track arrays composed of many tracks. In the following, a short overview on the possible shapes is given. The used techniques comprise mainly (1) variation of the track recording material, (2) variation of the etchant, and (3) partial or complete annealing.

BLAND

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Introductionctrons changes the solubility of the resist film in the developing medium and enables in this way the transfer of information from the mask onto the resist film. The structured resist film itself serves in turn as a stencil for transferring the resist film pattern onto the silicon substrate.

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相符

Formation of the latent trackreorganize in the form of a track core, a heavily disturbed zone of about 0.01 μm diameter along the ion path. It involves the diffusion of many particles in a highly disturbed solid and can be roughly described by semi-empirical models. The electronic defects lead to chemically activated sites (radicals) up to distances of about 1 μm.