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41#
發(fā)表于 2025-3-28 17:29:48 | 只看該作者
42#
發(fā)表于 2025-3-28 22:13:11 | 只看該作者
43#
發(fā)表于 2025-3-29 01:17:01 | 只看該作者
Flux Growth and Properties of Oxide Crystalsrowth mechanisms to be obtained by studying their morphology and the relief of the faces. Fourthly, the flux method is most similar to the growth of crystals under natural conditions and additional information on their genesis can be obtained. In a number of instances, rather large crystals can be p
44#
發(fā)表于 2025-3-29 06:05:06 | 只看該作者
Microstructure and Electrophysical Properties of YBa2Cu3O7–δ Filmsienting effect. On (001)SrTiO. substrates, the c axis is usually perpendicular to the substrate although a horizontal placement has also been noted [3, 4, 6, 7]. Film orientations for which the ., ., and . axes are parallel to {100} SrTiO., i.e., the c axis of YBa.Cu.O. (YBCO) is parallel to the sub
45#
發(fā)表于 2025-3-29 09:13:28 | 只看該作者
https://doi.org/10.1057/9781137296931ng to vacancy creep and defects in the crystalline structure that can propagate by diffusion. In multicomponent systems, vacancy fluxes arise during diffusion if the partial diffusion coefficients are different. Diffusional vacancy fluxes lead to Frenkel effects such as the development of porosity a
46#
發(fā)表于 2025-3-29 11:47:37 | 只看該作者
Organisation of Parties in the EU, methods for growing silicon carbide crystals have been under development. A thermodynamic analysis of the growth of SiC single crystals from the melt demonstrated that the SiC melt itself can exist at temperatures greater than 3460 K and pressures greater than 10. MPa. This has not yet enabled the
47#
發(fā)表于 2025-3-29 16:20:20 | 只看該作者
48#
發(fā)表于 2025-3-29 20:48:40 | 只看該作者
49#
發(fā)表于 2025-3-30 01:28:32 | 只看該作者
https://doi.org/10.1007/978-3-319-65295-5Technologies capable of growing semiconducting heterostructures as thin films (~100? ) are necessary to the development of semiconducting quantum-size electronics. Such structures are presently fabricated mainly by molecular-beam epitaxy and gas-phase epitaxy from organometallic compounds.
50#
發(fā)表于 2025-3-30 04:57:03 | 只看該作者
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