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Titlebook: Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams; Efim Oks,Ian Brown Book 2002 Kluwer Academic Publishers 2002

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書(shū)目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams
編輯Efim Oks,Ian Brown
視頻videohttp://file.papertrans.cn/309/308195/308195.mp4
叢書(shū)名稱NATO Science Series II: Mathematics, Physics and Chemistry
圖書(shū)封面Titlebook: Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams; Efim Oks,Ian Brown Book 2002 Kluwer Academic Publishers 2002
描述The NATO-sponsored Advanced Research Workshop (ARW) on "Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams" was held at the Baikal Dunes Resort, Lake Baikal, Russia, on June 24-28, 2002. Participants were from NATO countries Belgium, Czech Republic, Germany, Poland, Turkey and the USA, and from NATO partner countries Bulgaria, Russia, Ukraine and Uzbekistan. The goal of the meeting was to bring together researchers involved in novel applications of plasmas and ion/electron beams formed from vacuum arc discharges, especially in less conventional or emerging scientific areas such as new perspectives on vacuum arc phenomena, generation of high charge state metal ions, heavy ion accelerator injection, multi-layer thin film synthesis, biological applications, generation of high-current high-density electron beams, and more. It was our hope that the meeting would engender new research directions and help to establish new collaborations, prompt new thinking for research and technology applications of vacuum arc science, and in general foster development of the field. The Workshop was a great success, as was clearly felt by all of the attendees. The small number of
出版日期Book 2002
關(guān)鍵詞Plasma; electron; heavy ion; ion; metals; plasma physics
版次1
doihttps://doi.org/10.1007/978-94-010-0277-6
isbn_softcover978-1-4020-1066-8
isbn_ebook978-94-010-0277-6Series ISSN 1568-2609
issn_series 1568-2609
copyrightKluwer Academic Publishers 2002
The information of publication is updating

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Vacuum Arc Deposited DLC Based Coatings, formation of nanocrystals is possible and the properties of the coatings change drastically. All these approaches were investigated on films prepared by cathodic arc and a synthesis of the results is presented here.
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https://doi.org/10.1007/978-1-84800-382-8tion dissipated in the plasma moves away with the expanding plasma. A possible response of the discharge is to self-adjust the total burning voltage. Through this path, the cohesive energy would affect plasma parameters via the causal chain: cohesive energy — burning voltage — power dissipation — el
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https://doi.org/10.1007/978-3-662-50440-6hodic arc plasma deposition system designed to deposit a variety of multilayered thin film materials with various interface morphologies. We discuss also methods of producing multilayered materials in single source continuous arc systems.
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