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Titlebook: Embedded Memories for Nano-Scale VLSIs; Kevin Zhang Book 2009 Springer-Verlag US 2009 DRAM.Embedded DRAMs.Embedded Non-Volatile Memory.Mem

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發(fā)表于 2025-3-23 11:02:23 | 只看該作者
ations, then describes how and why embedded flash memory has expanded the functions and applications supported by process, device, and circuit technology evolutions. Embedded-specific flash memory technologies focused on the floating-gate and charge-trapping devices with split-gate and 2Tr cell conc
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發(fā)表于 2025-3-23 16:06:39 | 只看該作者
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發(fā)表于 2025-3-23 19:43:33 | 只看該作者
Introduction to Nonlinear Viscoelasticity,ates for stored data. The basic idea behind FeRAM appeared in 1963 [1] and 1988 [2], however, there have been many scientific and technical improvements needed to convert FeRAM technology into manufactured devices and still further improvements in materials, process fabrication, and circuit architec
14#
發(fā)表于 2025-3-24 00:28:51 | 只看該作者
Music and Science: Tribute to Rolf Hagedorn This problem is particularly crippling for . (HRCs) – circuits like SRAM cells, nonvolatile memory cells, and other memory cells that are replicated millions of times on the same chip – because of aggressive cell design, the requirement of meeting very high >5σ levels of yield and the usual higher
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發(fā)表于 2025-3-24 02:54:00 | 只看該作者
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發(fā)表于 2025-3-24 07:14:41 | 只看該作者
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發(fā)表于 2025-3-24 11:38:51 | 只看該作者
Book 2009perior speed and full compatibility with logic process technology. But as the technology scaling continues, SRAM design is facing severe challenge in mainta- ing suf?cient cell stability margin under relentless area scaling. Meanwhile, rapid expansion in mobile application, including new emerging ap
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發(fā)表于 2025-3-24 16:26:34 | 只看該作者
Embedded SRAM Design in Nanometer-Scale Technologies,s the transistor threshold voltage mismatching becomes significant. This also makes it more difficult to scale the operating voltage (..) while keeping the compatibility with logic’s. This chapter intends to provide an overview on the state-of-the-art SRAM circuit design technologies to address the
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發(fā)表于 2025-3-24 20:04:37 | 只看該作者
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發(fā)表于 2025-3-25 00:00:33 | 只看該作者
1558-9412 caling continues, SRAM design is facing severe challenge in mainta- ing suf?cient cell stability margin under relentless area scaling. Meanwhile, rapid expansion in mobile application, including new emerging ap978-1-4419-4694-2978-0-387-88497-4Series ISSN 1558-9412 Series E-ISSN 1558-9420
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