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Titlebook: Ellipsometry for Industrial Applications; Karl Riedling Book 1988 Springer-Verlag/Wien 1988 circuit.ellipsometry.film.semiconductor.surfac

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樓主: 突然
11#
發(fā)表于 2025-3-23 10:47:58 | 只看該作者
Error Effects in Ellipsometric Investigations,Ellipsometric measurements are, like any experiment, subject to various error effects which may distort their results to a more or less critical degree.
12#
發(fā)表于 2025-3-23 14:58:17 | 只看該作者
https://doi.org/10.1007/978-3-7091-8961-0circuit; ellipsometry; film; semiconductor; surface; surface analysis; thin films
13#
發(fā)表于 2025-3-23 21:11:44 | 只看該作者
978-3-211-82040-7Springer-Verlag/Wien 1988
14#
發(fā)表于 2025-3-24 00:53:56 | 只看該作者
Logic Approximating Sequences of Setschnique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.
15#
發(fā)表于 2025-3-24 04:24:54 | 只看該作者
16#
發(fā)表于 2025-3-24 07:59:50 | 只看該作者
Basics of Ellipsometry,t a monochromatic electromagnetic wave changes its state of polarization if it strikes non-perpendicularly the interface between two dielectric media. In general, any arbitrary monochromatic transversal wave can be considered composed of two orthogonal coherent waves with a fixed phase relation, e.g
17#
發(fā)表于 2025-3-24 12:54:37 | 只看該作者
Ellipsometry in Microelectronic Technology,chnique within the field of microelectronic technology concentrate on the investigation of semiconducting substrates and layers, and the modifications they undergo during various technological processes. In most cases, spectroscopic methods are applied.
18#
發(fā)表于 2025-3-24 17:09:12 | 只看該作者
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19#
發(fā)表于 2025-3-24 20:24:12 | 只看該作者
6樓
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發(fā)表于 2025-3-25 02:56:20 | 只看該作者
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